Adhesion Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Adhesion returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
2Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
3Capacitance spectroscopy of gate-defined electronic lattices
4Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
5Copper-ALD Seed Layer as an Enabler for Device Scaling
6Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
7Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
8High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
9Hydrogen plasma-enhanced atomic layer deposition of copper thin films
10In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
11Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
12Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
13Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
14PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
15Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
16Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
17Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
18Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
19Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
20Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
21Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection


Shortcuts



© 2014-2019 plasma-ald.com