Wet Etch Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Wet Etch Resistance returned 26 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
3Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
4Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
5Challenges in spacer process development for leading-edge high-k metal gate technology
6Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
7Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
8Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
9Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
10Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
11Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
12Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
13Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
14Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
15Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
16Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
17Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
18Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
19Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
20Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
21Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
22Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
23Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
24The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
25Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
26Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies