Wet Etch Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Wet Etch Resistance returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
3Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
4Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
5Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
6Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
7Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
8Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
9Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
10Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
11Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
12The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
13Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
14Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies


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