Wet Etch Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Wet Etch Resistance returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
3Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
4Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
5Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
6Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
7Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
8Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
9Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
10The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
11Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
12Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies


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