Surface Reactions Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Surface Reactions returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
2Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
3Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
4Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
5Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
6Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
7Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
8Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
9Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
10Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
11Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
12In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
13Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
14Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
15Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
16Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
17Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
18Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
19Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
20Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
21Fundamental beam studies of radical enhanced atomic layer deposition of TiN
22Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
23Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
24Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
25Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
26An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
27Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
28Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4