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Mobility Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Mobility returned 49 record(s).

NumberTitle
1Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
2Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
3Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
4Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
5Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
6Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
7Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
8Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
9The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
10Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
11High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
12Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
13Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
14Plasma-Modified Atomic Layer Deposition
15Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
16Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
17Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
18Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
19The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
20Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
21Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
22Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
23Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
24Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
25Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
26Gate Insulator for High Mobility Oxide TFT
27Perspectives on future directions in III-N semiconductor research
28Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
29Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
30A route to low temperature growth of single crystal GaN on sapphire
31Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
32Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
33Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
34Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
35Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
36Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
37Fast Flexible Plastic Substrate ZnO Circuits
38Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
39Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
40Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
41Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
42Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
43High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
44Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
45Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
46Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
47Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
48Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films