Uniformity Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Uniformity returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
2Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
3Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
4Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
5Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
6Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
7Film Uniformity in Atomic Layer Deposition
8Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
9Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
10Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
11PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
12Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
13Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
14Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization


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