Uniformity Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Uniformity returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
2Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
3Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
4Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
5Film Uniformity in Atomic Layer Deposition
6Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
7Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
8Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
9Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
10Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
11PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
12Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
13Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
14Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
15Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
16Innovative remote plasma source for atomic layer deposition for GaN devices
17Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
18Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
19Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
20Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
21Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
22Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
23Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
24Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
25Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
26Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
27Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
28Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization