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Precursor Characterization Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Precursor Characterization returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Gold Metal
2Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
3Copper-ALD Seed Layer as an Enabler for Device Scaling
4Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
5Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
6PEALD of Copper using New Precursors for Next Generation of Interconnections
7Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
8Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
9Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
10Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
11Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
12Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
13Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
14Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD

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