Precursor Characterization Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Precursor Characterization returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Gold Metal
2Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
3Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
4Copper-ALD Seed Layer as an Enabler for Device Scaling
5Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
6Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
7PEALD of Copper using New Precursors for Next Generation of Interconnections
8Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
9Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
10Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
11Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
12Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
13Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
14Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
15Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD


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