Minority Carrier Lifetime Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Minority Carrier Lifetime returned 23 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
2Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
3Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
4Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
5Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
6Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
7On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
8Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
9Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
10Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
11Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
12Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
13Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
14Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
15Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
16Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
17Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
18Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
19Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
20The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
21Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
22Trapped charge densities in Al2O3-based silicon surface passivation layers
23Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers


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