Minority Carrier Lifetime Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Minority Carrier Lifetime returned 25 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
2Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
3Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
4Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
5Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
6Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
7Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
8Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
9Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
10Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
11The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
12Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
13Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
14Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
15Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
16Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
17Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
18Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
19Trapped charge densities in Al2O3-based silicon surface passivation layers
20Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
21Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
22Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
23On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
24Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
25Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor