Minority Carrier Lifetime Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Minority Carrier Lifetime returned 24 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
2Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
3Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
4Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
5Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
6Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
7Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
8On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
9Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
10Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
11Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
12Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
13Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
14Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
15Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
16Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
17Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
18Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
19Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
20Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
21The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
22Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
23Trapped charge densities in Al2O3-based silicon surface passivation layers
24Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers