Interlayer Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Interlayer returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
2	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
3	Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
4	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
5	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
6	HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
7	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
8	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
9	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
10	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
11	In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
12	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
13	Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
14	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
15	The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
16	Thin film GaP for solar cell application
17	Very high frequency plasma reactant for atomic layer deposition
18	WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
19	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition

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