Interlayer Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Interlayer returned 23 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
2Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
3HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
4Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
5Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
6AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
7Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
8Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
9Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
10Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
11Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
12In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
13Very high frequency plasma reactant for atomic layer deposition
14Thin film GaP for solar cell application
15WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
16Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
17The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
18Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
19Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
20Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
21Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
22Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics