Interlayer Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Interlayer returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
2Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
3Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
4Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
5Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
6HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
7Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
8Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
9Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
10Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
11In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
12Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
13Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
14Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
15The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
16Thin film GaP for solar cell application
17Very high frequency plasma reactant for atomic layer deposition
18WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
19Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition

Mark Sowa

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