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Deposition Kinetics, Reaction Mechanism Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Deposition Kinetics, Reaction Mechanism returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
2Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
3Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
4Chemical reactions during plasma-enhanced atomic layer deposition of SiO2 films employing aminosilane and O2/Ar plasma at 50°C
5Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
6Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
7Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
8Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
9Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
10Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
11Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
12The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
13RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
14Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
15RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
16Room-Temperature Atomic Layer Deposition of Platinum
17Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
18Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
19RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
20Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
21Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets