Carrier Concentration Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Carrier Concentration returned 43 record(s).

Number	Title
1	Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
2	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
3	Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
4	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
5	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
6	Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
7	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
8	Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
9	Capacitance characterization of GaP/n-Si structures grown by PE-ALD
10	Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
11	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
12	Microwave properties of superconducting atomic-layer deposited TiN films
13	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
14	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
15	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
16	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V₂O₅
17	Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
18	Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
19	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
20	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H₂O-, O₂-, and O₃-Based Atomic Layer Deposition
21	Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
22	Perspectives on future directions in III-N semiconductor research
23	Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO₂ Thin Films via Atomic Layer Deposition
24	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
25	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
26	Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnO_x infrared transparent conductive thin films
27	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO_x as conductive gas diffusion barrier
28	Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
29	Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
30	P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
31	Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
32	n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
33	Plasma-enhanced atomic layer deposition of SnO₂ thin films using SnCl₄ and O₂ plasma
34	Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
35	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
36	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
37	All-oxide thin-film transistors with channels of mixed InO_x-ZnO_y formed by plasma-enhanced atomic layer deposition process
38	Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
39	Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
40	Effect of Oxygen Source on the Various Properties of SnO₂ Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
41	Properties and Mechanism of PEALD-In₂O₃ Thin Films Prepared by Different Precursor Reaction Energy
42	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
43	Plasma-Modified Atomic Layer Deposition

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Carrier Concentration Plasma Enhanced Atomic Layer Deposition Publications