Optical Bandgap Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Optical Bandgap returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of InN using trimethylindium and ammonia plasma
2Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
3Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
4Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
5Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
6Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
7Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
8Nitride memristors
9Optical properties and bandgap evolution of ALD HfSiOx films
10Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
11Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
12Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
13Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
14Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
15Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
16Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
17Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition