Work Function Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Work Function returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
3Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
4Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
5Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
6Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
7Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
8Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
9Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
10Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
11The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
12Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
13Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
14Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
15Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices

Mark Sowa

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