Work Function Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Work Function returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
2Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
3Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
4Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
5Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
6Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
7High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
8Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
9Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
10Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
11Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
12Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
13Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
14Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
15Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
16Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
17The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
18Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
19Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
20Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
21Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices