Work Function Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Work Function returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
2Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
3Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
4The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
5High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
6Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
7Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
8Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
9Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
10Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
11Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
12Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
13Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
14Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
15Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
16Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
17Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
18Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
19Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
20Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
21Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors