Etch Rate Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Etch Rate returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
2Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
3Composite materials and nanoporous thin layers made by atomic layer deposition
4Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
5Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
6DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
7Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
8Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
9Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
10High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
11Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
12Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
13PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
14Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
15Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
16Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD


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