Etch Rate Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Etch Rate returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
2Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
3Composite materials and nanoporous thin layers made by atomic layer deposition
4Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
5DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
6Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
7Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
8High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
9Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
10Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
11PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
12Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
13Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
14Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD

Mark Sowa

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