Etch Rate Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Etch Rate returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
2A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
3Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
4Composite materials and nanoporous thin layers made by atomic layer deposition
5Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
6Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
7DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
8Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
9Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
10Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
11High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
12Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
13Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
14Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
15PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
16Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
17Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
18Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD