Etch Rate Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Etch Rate returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
2DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
3Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
4Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
5Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
6A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
7A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
8Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
9Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
10Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
11Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
12Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
13Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
14High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
15Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
16Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
17PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
18Composite materials and nanoporous thin layers made by atomic layer deposition
19Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
20Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor