Etch Rate Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Etch Rate returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
2Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
3Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
4Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
5A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
6Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
7Composite materials and nanoporous thin layers made by atomic layer deposition
8Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
9Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
10Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
11High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
12Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
13Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
14A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
15Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
16Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
17Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
18DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
19PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
20Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition