Nucleation Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Nucleation returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
2In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
3Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
4Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
5Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
6Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
7Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
8Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
9Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
10Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
11Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
12Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
13Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
14Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
15Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
16Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
17Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
18In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
19Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering