Electron Density, ne Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Electron Density, ne returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
2Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
3Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
4The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
5Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
6Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
7Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
8Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
9Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
10Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
11Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
12Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
13Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
14Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
15Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
16Atomic Layer Deposition of the Conductive Delafossite PtCoO2
17Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition