Publication Information

Title:
Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition
Type:
Journal
Info:
J. Mater. Chem. C, 2018, 6, 6471-6482
Date:
2018-05-18

Author Information

Name Institution
Ali HaiderBilkent University
Petro DeminskyiBilkent University
Mehmet YilmazBilkent University
Kholoud ElmabrukAljabal Algharbi University
Ibrahim YilmazTurgut Özal University
Necmi BiyikliUniversity of Connecticut

Films



Plasma InN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Si(100)

Keywords

Notes

Meaglow Hollow Cathode plasma used
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