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Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition
Type:
Journal
Info:
J. Mater. Chem. C, 2018, 6, 6471-6482
Date:
2018-05-18
Author Information
| Name | Institution |
|---|---|
| Ali Haider | Bilkent University |
| Petro Deminskyi | Bilkent University |
| Mehmet Yilmaz | Bilkent University |
| Kholoud Elmabruk | Aljabal Algharbi University |
| Ibrahim Yilmaz | Turgut Özal University |
| Necmi Biyikli | University of Connecticut |
Films
Plasma GaN
Plasma AlN
Plasma InN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Substrates
| Si(100) |
Notes
| Meaglow Hollow Cathode plasma used |
| 1427 |