Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Band Gap Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Band Gap returned 44 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
2ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
3Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
4Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
5Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
6Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
7Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
8Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
9Plasma enhanced atomic layer deposition of Ga2O3 thin films
10Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
11Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
12Trilayer Tunnel Selectors for Memristor Memory Cells
13Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
14Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
15Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
16In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
17Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
18Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
19Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
20Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
21In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
22Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
23Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
24Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
25Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
26Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
27Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
28Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
29Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
30In-gap states in titanium dioxide and oxynitride atomic layer deposited films
31Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
32Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
33Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
34Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
35Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
36Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
37All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
40Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
41Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
42Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
43Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
44Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis