Publication Information

Title: Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 01A110 (2018)

Date: 2017-11-14

DOI: http://dx.doi.org/10.1116/1.4998920

Author Information

Name

Institution

Marmara University

Marmara University

Films

Deposition Temperature = 200C

75-24-1

7727-37-9

Deposition Temperature = 200C

75-24-1

7727-37-9

1333-74-0

Deposition Temperature = 200C

1445-79-0

7727-37-9

Deposition Temperature = 200C

1445-79-0

7727-37-9

1333-74-0

Deposition Temperature = 200C

3385-78-2

7727-37-9

Deposition Temperature = 200C

3385-78-2

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Extinction Coefficient

Ellipsometry

J.A. Woollam VASE

Vibrational Properties

FTIR Spectroscopic Ellipsometry

J.A. Woollam IR-VASE

Optical Absorption

Optical Absorption

-

Substrates

Si(100)

Keywords

Notes

1052



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