Publication Information

Title:
Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A123 (2016)
Date:
2015-11-06

Author Information

Name Institution
Ali HaiderBilkent University
Seda KizirBilkent University
Çağla ÖzgitBilkent University
Ali Kemal OkyayBilkent University
Necmi BiyikliBilkent University

Films




Plasma InN




Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Transmittance
Analysis: Optical Transmission

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Substrates

Silicon
Quartz

Keywords

Notes

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