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Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A123 (2016)
Date:
2015-11-06
DOI:
http://dx.doi.org/10.1116/1.4936072

Author Information

Name Institution
Ali HaiderBilkent University
Seda KizirBilkent University
Çağla ÖzgitBilkent University
Ali Kemal OkyayBilkent University
Necmi BiyikliBilkent University

Films

Plasma BN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEB, BEt3, B(C2H5)3, TriEthylBoron, TriEthylBorane
CAS#: 97-94-9
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 450C

Plasma BN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEB, BEt3, B(C2H5)3, TriEthylBoron, TriEthylBorane
CAS#: 97-94-9
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 450C

Plasma GaN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 450C

Plasma InN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
In(CH3)3, InMe3, TriMethyl Indium, TMI
CAS#: 3385-78-2
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 450C

Plasma BInN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEB, BEt3, B(C2H5)3, TriEthylBoron, TriEthylBorane
CAS#: 97-94-9
In(CH3)3, InMe3, TriMethyl Indium, TMI
CAS#: 3385-78-2
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 450C

Plasma BGaN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEB, BEt3, B(C2H5)3, TriEthylBoron, TriEthylBorane
CAS#: 97-94-9
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 450C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: PSIA XE-100E

Characteristic: Transmittance
Analysis: Optical Transmission
Diagnostic: Ocean Optics HR4000CG-UV-NIR

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam VASE

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam VASE

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam VASE

Substrates

Silicon
Quartz

Notes

414