Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A123 (2016)
Date:
2015-11-06
Author Information
| Name | Institution |
|---|---|
| Ali Haider | Bilkent University |
| Seda Kizir | Bilkent University |
| Çağla Özgit | Bilkent University |
| Ali Kemal Okyay | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Plasma BN
Plasma BN
Plasma GaN
Plasma InN
Plasma BInN
Plasma BGaN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Transmittance
Analysis: Optical Transmission
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Substrates
| Silicon |
| Quartz |
Notes
| 414 |