Your search for plasma enhanced atomic layer deposition publications discussing Effective Oxide Charge, Qeff returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment|
|2||Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition|
|3||Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition|
|4||High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates|
|5||Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks|
|6||Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications|
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