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Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A107 (2018)
Date:
2017-10-27
Author Information
| Name | Institution |
|---|---|
| Petro Deminskyi | Bilkent University |
| Ali Haider | Bilkent University |
| Evgeniya Kovalska | Bilkent University |
| Necmi Biyikli | University of Connecticut |
Films
Plasma AlN
Plasma InN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si(100) |
| Graphene |
Notes
| Meaglow plasma source. |
| 1083 |