Publication Information

Title:
Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A107 (2018)
Date:
2017-10-27

Author Information

Name Institution
Petro DeminskyiBilkent University
Ali HaiderBilkent University
Evgeniya KovalskaBilkent University
Necmi BiyikliUniversity of Connecticut

Films


Plasma InN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Substrates

Si(100)
Graphene

Keywords

Area Selective

Notes

Meaglow plasma source.
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