Christophe Detavernier Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Christophe Detavernier returned 38 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
2Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
3Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
4Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
5Texture of atomic layer deposited ruthenium
6Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
7Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
8Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
9Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
10Plasma-enhanced atomic layer deposition of zinc phosphate
11Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
12Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
13Atomic layer deposition of titanium nitride from TDMAT precursor
14Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
15Plasma enhanced atomic layer deposition of zinc sulfide thin films
16TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
17Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
18Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
19Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
20Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
21Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
22Plasma enhanced atomic layer deposition of Ga2O3 thin films
23Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
24A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
25Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
26Plasma enhanced atomic layer deposition of gallium sulfide thin films
27Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
28Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
29Plasma enhanced atomic layer deposition of aluminum sulfide thin films
30Ru thin film grown on TaN by plasma enhanced atomic layer deposition
31Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
32Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
33Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
34A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
35Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
36Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
37Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
38Tuning size and coverage of Pd nanoparticles using atomic layer deposition