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Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 062402 (2021)
Date:
2021-08-26
Author Information
| Name | Institution |
|---|---|
| Andreas Werbrouck | Ghent University |
| Kevin Van de Kerckhove | Ghent University |
| Diederik Depla | Ghent University |
| Dirk Poelman | Ghent University |
| Philippe F. Smet | Ghent University |
| Jolien Dendooven | Ghent University |
| Christophe Detavernier | Ghent University |
Films
Plasma Al2O3
Plasma Plasma Study
Film/Plasma Properties
Characteristic: Ion Energy
Analysis: Ion Energy Analyzer
Characteristic: Plasma Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Conformality, Step Coverage
Analysis: Custom
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Silicon |
Notes
| 1664 |