Publication Information

Title: Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Type: Journal

Info: Chem. Commun., 2015,51, 3556-3558

Date: 2015-01-22

DOI: http://dx.doi.org/10.1039/C4CC09474C

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Ghent University

Films

Thermal Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

7732-18-5

Plasma Al2O3 using Custom ICP

Deposition Temperature = 150C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

FEI Quanta 200 FEG

Wetting Angle

Sessile Drop Tests

Advex

Substrates

PTFE

Keywords

Hydrophilic

Notes

Custom ICP PEALD and thermal ALD Al2O3 comparison for improving wettability and gluability of PTFE.

327

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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