Publication Information

Title: Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma

Type: Journal

Info: J. Mater. Chem. C, 2015, 3, 4848-4851

Date: 2015-04-20

DOI: http://dx.doi.org/10.1039/C5TC00751H

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

IMEC

Ghent University

Films

Plasma Ru using Custom

Deposition Temperature Range = 50-100C

20427-56-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

509

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com