RuO4, ruthenium tetroxide, CAS# 20427-56-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1RuMobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
2RuNear room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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