1 | ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method |
2 | Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System |
3 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
4 | Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment |
5 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
6 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
7 | Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas |
8 | Encapsulation method for atom probe tomography analysis of nanoparticles |
9 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
10 | Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition |
11 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
12 | Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma |
13 | Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition |
14 | Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides |
15 | A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD |
16 | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers |
17 | From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications |
18 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
19 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
20 | Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition |
21 | Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition |
22 | Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates |
23 | Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma |
24 | Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films |
25 | Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors |
26 | Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method |
27 | Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor |
28 | Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems |
29 | Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions |
30 | Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process |
31 | Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment |
32 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
33 | Room temperature atomic layer deposition of TiO2 on gold nanoparticles |
34 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
35 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
36 | Alloyed 2D Metal-Semiconductor Atomic Layer Junctions |
37 | Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method |
38 | Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases |
39 | Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone |
40 | Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures |
41 | Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition |
42 | Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon |
43 | Controlled erbium incorporation and photoluminescence of Er-doped Y2O3 |
44 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition |
45 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
46 | Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor |
47 | Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper |
48 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
49 | Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor |
50 | Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
51 | Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition |
52 | Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition |
53 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
54 | Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor |
55 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
56 | Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications |
57 | Oxide semiconductor thin film transistors on thin solution-cast flexible substrates |
58 | Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals |
59 | Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method |
60 | Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source |
61 | Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition |
62 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
63 | In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating |
64 | Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET |
65 | Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects |
66 | Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices |
67 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
68 | Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum |
69 | Plasma enhanced atomic layer deposition of Fe2O3 thin films |
70 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
71 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
72 | Designing high performance precursors for atomic layer deposition of silicon oxide |
73 | Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms |
74 | PEALD of a Ruthenium Adhesion Layer for Copper Interconnects |
75 | Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy |
76 | Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma |
77 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
78 | The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism |
79 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
80 | High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition |
81 | Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition |
82 | Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations |
83 | Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition |
84 | Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2 |
85 | RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor |
86 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
87 | Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition |
88 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
89 | Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium |
90 | Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes |
91 | A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment |
92 | Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure |
93 | Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System |
94 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
95 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
96 | Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD) |
97 | Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets |
98 | Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation |
99 | Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia |
100 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
101 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
102 | Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization |
103 | Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma |
104 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
105 | Fast PEALD ZnO Thin-Film Transistor Circuits |
106 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
107 | Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma |
108 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
109 | XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films |
110 | Atomic layer deposition of titanium nitride from TDMAT precursor |
111 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
112 | Atmospheric pressure plasma enhanced spatial ALD of silver |
113 | Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers |
114 | Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen |
115 | Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application |
116 | Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating |
117 | Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application |
118 | Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition |
119 | Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions |
120 | Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas |
121 | Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films |
122 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
123 | Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric |
124 | Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications |
125 | Fixed-Gap Tunnel Junction for Reading DNA Nucleotides |
126 | PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads |
127 | Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition |
128 | Optical and Electrical Properties of AlxTi1-xO Films |
129 | Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system |
130 | Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co |
131 | Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells |
132 | Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires |
133 | Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions |
134 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
135 | Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon |
136 | Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices |
137 | Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries |
138 | Low-Power Double-Gate ZnO TFT Active Rectifier |
139 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
140 | Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition |
141 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
142 | Patterned deposition by plasma enhanced spatial atomic layer deposition |
143 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
144 | Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition |
145 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
146 | Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing |
147 | Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition |
148 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
149 | Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide |
150 | Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization |
151 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
152 | Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films |
153 | Optical and Electrical Properties of TixSi1-xOy Films |
154 | Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates |
155 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
156 | Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8] |
157 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
158 | Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films |
159 | Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate |
160 | Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition |
161 | Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers |
162 | Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon |
163 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
164 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
165 | Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen |
166 | Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition |
167 | Ru thin film grown on TaN by plasma enhanced atomic layer deposition |
168 | Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals |
169 | Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition |
170 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
171 | Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics |
172 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
173 | Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy |
174 | RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor |
175 | Localized defect states and charge trapping in atomic layer deposited-Al2O3 films |
176 | Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy |
177 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
178 | Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition |
179 | Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects |
180 | Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer |
181 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
182 | Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode |
183 | Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl |