Custom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom hardware returned 152 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
3Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
4Atmospheric pressure plasma enhanced spatial ALD of silver
5Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
6Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
7Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
8Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
9Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
10Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
11Atomic layer deposition of titanium nitride from TDMAT precursor
12Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
13Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
14Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
15Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
16Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
17Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
18Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
19Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
20Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
21Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
22Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
23Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
24Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
25Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
26Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
27Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
28Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
29Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
30Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
31Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
32Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
33Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
34Designing high performance precursors for atomic layer deposition of silicon oxide
35Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
36Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
37Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
38Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
39Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
40Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
41Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
42Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
43Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
44Encapsulation method for atom probe tomography analysis of nanoparticles
45Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
46Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
47Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
48Fast PEALD ZnO Thin-Film Transistor Circuits
49Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
50Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
51Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
52Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
53Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
54Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
55High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
56High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
57Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
58Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
59Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
60Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
61In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
62In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
63In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
64Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
65Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
66Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
67Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
68Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
69Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
70Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
71Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
72Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
73Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
74Low-Power Double-Gate ZnO TFT Active Rectifier
75Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
76Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
77Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
78Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
79Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
80Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
81Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
82Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
83Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
84Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
85Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
86Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
87Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
88Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
89Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
90Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
91Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
92Optical and Electrical Properties of AlxTi1-xO Films
93Optical and Electrical Properties of TixSi1-xOy Films
94Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
95Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
96Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
97Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
98Patterned deposition by plasma enhanced spatial atomic layer deposition
99PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
100Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
101Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
102Plasma enhanced atomic layer deposition of Fe2O3 thin films
103Plasma enhanced atomic layer deposition of Ga2O3 thin films
104Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
105Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
106Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
107Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
108Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
109Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
110Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
111Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
112Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
113Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
114Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
115Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
116Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
117Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
118Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
119Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
120Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
121Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
122Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
123Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
124Remote Plasma ALD of Platinum and Platinum Oxide Films
125Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
126Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
127Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
128Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
129Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
130Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
131Room temperature atomic layer deposition of TiO2 on gold nanoparticles
132Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
133Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
134RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
135RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
136Ru thin film grown on TaN by plasma enhanced atomic layer deposition
137Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
138Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
139Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
140Study on the characteristics of aluminum thin films prepared by atomic layer deposition
141Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
142Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
143Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
144Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
145The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
146The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
147Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
148Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
149Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
150Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
151Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
152Very high frequency plasma reactant for atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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