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Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A123
Date:
2013-11-30
Author Information
| Name | Institution |
|---|---|
| Shaoren Deng | Ghent University |
| Sammy W. Verbruggen | University of Antwerp |
| Silvia Lenaerts | University of Antwerp |
| Johan A. Martens | KU Leuven |
| Sven Van den Berghe | SCK-CEN |
| Kilian Devloo-Casier | Ghent University |
| Wouter Devulder | Ghent University |
| Jolien Dendooven | Ghent University |
| Davy Deduytsche | Ghent University |
| Christophe Detavernier | Ghent University |
Films
Thermal TiO2
Plasma TiN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: UV-Vis Transmission
Analysis: Custom
Characteristic: Band Gap
Analysis: Tauc Plotting
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Photocatalytic Activity
Analysis: -
Substrates
| Si(100) |
| Quartz |
Notes
| Anneals |
| 7 |