Publication Information

Title: A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Type: Journal

Info: Surface and Coatings Technology Volume 213, December 2012, Pages 183-191

Date: 2012-10-19

DOI: http://dx.doi.org/10.1016/j.surfcoat.2012.10.045

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Umicore

Ghent University

Films

Thermal Al2O3 using Custom Rotary

Deposition Temperature = 200C

75-24-1

7732-18-5

Plasma Al2O3 using Custom Rotary

Deposition Temperature = 200C

75-24-1

7782-44-7

Thermal TiO2 using Custom Rotary

Deposition Temperature = 150C

3275-24-9

7732-18-5

Thermal AlN using Custom Rotary

Deposition Temperature = 100C

75-24-1

7664-41-7

Plasma AlN using Custom Rotary

Deposition Temperature = 100C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

Unknown

Precursor Utilization

QMS, Quadrupole Mass Spectrometer

Hiden Analytical QMS

OES

OES, Optical Emission Spectroscopy

Ocean Optics QE65000 Spectrometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Surface Science Instruments

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

FEI Quanta 200 FEG

Conformality, Step Coverage

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Conformality, Step Coverage

XRF, X-Ray Fluorescence

Bruker Artax

Substrates

ZnO

Stainless Steel

Ti

Glass

Keywords

Powders/Particles

Notes

Custom rotary PEALD system demonstrated with variety of films on different particles.

181

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