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A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
Type:
Journal
Info:
Surface and Coatings Technology Volume 213, December 2012, Pages 183-191
Date:
2012-10-19
Author Information
| Name | Institution |
|---|---|
| Delphine Longrie | Ghent University |
| Davy Deduytsche | Ghent University |
| Jo Haemers | Ghent University |
| Kris Driesen | Umicore |
| Christophe Detavernier | Ghent University |
Films
Thermal Al2O3
Plasma Al2O3
Thermal TiO2
Thermal AlN
Plasma AlN
Film/Plasma Properties
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Precursor Utilization
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: OES
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: XRF, X-Ray Fluorescence
Substrates
| ZnO |
| Stainless Steel |
| Ti |
| Glass |
Notes
| Custom rotary PEALD system demonstrated with variety of films on different particles. |
| 181 |