Chemical Binding Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Chemical Binding returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
2Band alignment of Al2O3 with (-201) β-Ga2O3
3Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
4Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
5Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
6HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
7Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
8Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
9Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
10In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
11Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
12Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
13Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
14Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
15Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
16Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
17Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
18Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
19Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
20The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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