Publication Information

Title: Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma

Type: Journal

Info: physica status solidi (a)

Date: 2014-11-18

DOI: http://dx.doi.org/10.1002/pssa.201431630

Author Information

Name

Institution

Hanyang University

Films

Plasma TiO2 using Unknown

Deposition Temperature Range = 170-400C

0-0-0

7782-44-7

Plasma TiO2 using Unknown

Deposition Temperature Range N/A

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Mobility

AFM, Atomic Force Microscopy

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Thickness

Ellipsometry

Unknown

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Keywords

DRAM capacitor

PEALD Film Development

High-k Dielectric Thin Films

Notes

254

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

Follow plasma-ald.com

Follow @PlasmaALDGuy Tweet

Shortcuts



© 2014-2017 plasma-ald.com