Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
Type:
Journal
Info:
APL MATERIALS 2, 096109 (2014)
Date:
2014-08-26
Author Information
| Name | Institution |
|---|---|
| Ali Haider | Bilkent University |
| Çağla Özgit | Bilkent University |
| Fatma Kayaci | Bilkent University |
| Ali Kemal Okyay | Bilkent University |
| Tamer Uyar | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Plasma AlN
Plasma BN
Film/Plasma Properties
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Nylon 6,6 |
| Si(100) |
Notes
| Meaglow Ltd hollow cathode RF-plasma source was used. |
| BN film characterized as sequential CVD due to running considerably higher than the known thermal decomposition temperature for the TEB. |
| 305 |