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Publication Information

Title: Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition

Type: Journal

Info: APL MATERIALS 2, 096109 (2014)

Date: 2014-08-26

DOI: http://dx.doi.org/10.1063/1.4894782

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature = 100C

75-24-1

7727-37-9

1333-74-0

Deposition Temperature = 450C

97-94-9

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Images

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Quanta 200 FEG

Thickness

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Substrates

Nylon 6,6

Si(100)

Keywords

Sacrificial Template

Notes

Meaglow Ltd hollow cathode RF-plasma source was used.

BN film characterized as sequential CVD due to running considerably higher than the known thermal decomposition temperature for the TEB.

305

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