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Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition

Type:
Journal
Info:
APL MATERIALS 2, 096109 (2014)
Date:
2014-08-26
DOI:
http://dx.doi.org/10.1063/1.4894782

Author Information

Name Institution
Ali HaiderBilkent University
Çağla ÖzgitBilkent University
Fatma KayaciBilkent University
Ali Kemal OkyayBilkent University
Tamer UyarBilkent University
Necmi BiyikliBilkent University

Films

Plasma AlN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 100C

Plasma BN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TEB, BEt3, B(C2H5)3, TriEthylBoron, TriEthylBorane
CAS#: 97-94-9
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 450C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Tecnai G2 F30

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Tecnai G2 F30

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Substrates

Nylon 6,6
Si(100)

Notes

Meaglow Ltd hollow cathode RF-plasma source was used.
BN film characterized as sequential CVD due to running considerably higher than the known thermal decomposition temperature for the TEB.
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