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Gas Phase Species Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Gas Phase Species returned 49 record(s).

NumberTitle
1Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
2Plasma enhanced atomic layer deposition of zinc sulfide thin films
3Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
4Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
5Fundamental beam studies of radical enhanced atomic layer deposition of TiN
6Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
7Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
8Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
9Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
10Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
11Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
12Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
13Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
14In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
15Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
16In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
17Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
18Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
19Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
20Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
21Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
22Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
23Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
24Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
25The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
26Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
27Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
28The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
29Plasma enhanced atomic layer deposition of gallium sulfide thin films
30Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
31Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
32Plasma Enhanced Atomic Layer Deposition on Powders
33Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
34The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
35Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
36The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
37Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
38Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
39Plasma enhanced atomic layer deposition of aluminum sulfide thin films
40Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
41Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
42Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
43Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
44Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
45Plasma enhanced atomic layer deposition of Ga2O3 thin films
46Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
47New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
48Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
49Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth