2022 Year in Review

February 2023 Stats


The publication database currently has 1673 entries.
204 Films
279 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5136 Authors

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2021 Year in Review
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Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes

Electron Temperature, Te Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Electron Temperature, Te returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
2Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
3Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
4Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
5Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
6Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
7The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
8Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
9Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
10Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
11Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source

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