Yangdo Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yangdo Kim returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
2Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
3Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
4Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
5Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
6Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
7Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
8ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method