2022 Year in Review

August 2023 Stats


The publication database currently has 1695 entries.
210 Films
283 Precursors
78 Dep Hardware Sets
255 Characteristics
96 Theses
5204 Authors

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2021 Year in Review
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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films Gallium nitride thin films by microwave plasma-assisted ALD Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium

Yangdo Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yangdo Kim returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
2Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
3ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
4Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
5Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
6Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
7Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
8Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method

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