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The publication database currently has 1538 entries.
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189 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
239 Film and Plasma Characteristics
82 Theses

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Recent Database Additions
Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition α-Ga2O3 grown by low temperature atomic layer deposition on sapphire Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
Search 1538 plasma ALD publications by:
189 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
239 Film and Plasma Characteristics

Yangdo Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yangdo Kim returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
2Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
3Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
4Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
5Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
6Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
7Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
8ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method

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Top Authors
Erwin (W.M.M.) Kessels
Hyeongtag Jeon
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Mauritius C. M. (Richard) van de Sanden
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