Your search for plasma enhanced atomic layer deposition publications discussing Effective Charge Density returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films|
|2||Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition|
|3||Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods|
|4||Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics|
|5||Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches|
|6||Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation|
© 2014-2019 plasma-ald.com