Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Fill Factor Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Fill Factor returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
2Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
3Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
4Study of GaP/Si Heterojunction Solar Cells
5Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
6Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
7Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
8Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
9Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
10Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
11Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques