Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Short Circuit Current Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Short Circuit Current returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
2Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
3Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
4Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
5Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
6Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
7Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
8Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
9Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
10Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell