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Publication Information

Title: Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 041511 (2016)

Date: 2016-05-24

DOI: http://dx.doi.org/10.1116/1.4953463

Author Information

Name

Institution

Bilkent University

Bilkent University

Bilkent University

Films

Deposition Temperature = 200C

1115-99-7

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

Ellipsometry

J.A. Woollam VASE

Refractive Index

Ellipsometry

J.A. Woollam VASE

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

FEI Nova NanoSEM 600

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Asylum Research MFP-3D

Substrates

Si(100)

Si(111)

Sapphire

Keywords

Notes

908



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