Publication Information

Title:
Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 041511 (2016)
Date:
2016-05-24

Author Information

Name Institution
Seda KizirBilkent University
Ali HaiderBilkent University
Necmi BiyikliBilkent University

Films


Film/Plasma Properties

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)
Si(111)
Sapphire

Keywords

Notes

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