Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Top Film Searches August 2021

NumberFilmSearches
1NbN31
2AlN22
3AlON13
3GaN13
5TaNx12
5WO312
5Ag12
8WCN10
9Al2O39
9Er2O39