Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Ion Flux Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ion Flux returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
2The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
3Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
4Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
5Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
6Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
7Innovative remote plasma source for atomic layer deposition for GaN devices
8Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
9Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
10Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition