Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Strain Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Strain returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
2Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
3Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
4Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
5Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
6The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
7Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition