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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Strain Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Strain returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
2Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
3The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
4Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
5Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
6Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
7Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition