The publication database currently has 1573 entries.
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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
Search 1573 plasma ALD publications by:
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Correlation of interface states/border traps and threshold voltage shift on AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors
Type:
Journal
Info:
Applied Physics Letters 107, 093507 (2015)
Date:
2015-08-24
Author Information
| Name | Institution |
|---|---|
| Tian-Li Wu | IMEC |
| Denis Marcon | IMEC |
| Benoit Bakeroot | IMEC |
| Brice De Jaeger | IMEC |
| H. C. Lin | IMEC |
| Jacopo Franco | IMEC |
| Steve Stoffels | IMEC |
| Marleen Van Hove | IMEC |
| Robin Roelofs | ASM Microchemistry Oy |
| Guido Groeseneken | IMEC |
| Stefaan Decoutere | IMEC |
Films
Plasma SiNx
Film/Plasma Properties
Characteristic: Electrical Properties
Analysis: -
Characteristic: Interface Trap Density
Analysis: -
Characteristic: Threshold Voltage Shift
Analysis: -
Substrates
| AlGaN |
Keywords
Notes
| 388 |