Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Artem I. Baranov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Artem I. Baranov returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
2Capacitance characterization of GaP/n-Si structures grown by PE-ALD
3Influence of PE-ALD of GaP on the Silicon Wafers Quality
4Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
5Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
6Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
7Study of GaP/Si Heterojunction Solar Cells