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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Electrical characteristics of β-Ga2O3 thin films grown by PEALD
Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 593, 2014, Pages 190-195
Date:
2014-01-06
Author Information
| Name | Institution |
|---|---|
| Halit Altuntas | Cankiri Karatekin University |
| İnci Dönmez | Bilkent University |
| Çağla Özgit | Bilkent University |
| Necmi Biyikli | Bilkent University |
Films
Plasma Ga2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(111) |
Keywords
Notes
| 980 |