Publication Information

Title:
Electrical characteristics of β-Ga2O3 thin films grown by PEALD
Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 593, 2014, Pages 190-195
Date:
2014-01-06

Author Information

Name Institution
Halit AltuntasCankiri Karatekin University
İnci DönmezBilkent University
Çağla ÖzgitBilkent University
Necmi BiyikliBilkent University

Films

Plasma Ga2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(111)

Keywords

Notes

980