Search Plasma ALD Publication Database By...

Publication Information

Title: Study on the electrical characteristics of in situ PEALD-passivated HfO2/In0.53Ga0.47As MOSCAP and MOSFET structures

Type: Conference Proceedings

Info: 2016 China Semiconductor Technology International Conference (CSTIC)

Date: 2016-03-14

DOI: http://dx.doi.org/10.1109/CSTIC.2016.7464089

Author Information

Name

Institution

National Chiao Tung University

National Chiao Tung University

National Chiao Tung University

National Chiao Tung University

National Chiao Tung University

Films

Plasma AlN using Unknown

Deposition Temperature Range N/A

Thermal HfO2 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Passivation

Notes

826

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

Follow plasma-ald.com on Twitter

Follow @PlasmaALDGuy

Shortcuts



© 2014-2018 plasma-ald.com