Publication Information

Title:
Patterning of silicon nitride for CMOS gate spacer technology. III. Investigation of synchronously pulsed CH3F/O2/He plasmas
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 32, 021807 (2014)
Date:
2014-02-18

Author Information

Name Institution
Romuald BlancSTMicroelectronics
Fran├žois LeverdSTMicroelectronics
Maxine DarnonCEA - Grenoble
Gilles CungeCEA - Grenoble
Sylvain DavidCEA - Grenoble
Olivier JoubertCEA - Grenoble

Films

Plasma SiNx

Hardware used: Unknown


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

622