BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2, CAS# 186598-40-3

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Bis(t-butylamino)silane
2DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane
3Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
4Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
5Gelest🇺🇸Di(t-Butylamino)Silane
6EpiValence🇬🇧Bis(t-Butylamino) silane
7Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
2Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
3Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
4Residual stress study of thin films deposited by atomic layer deposition
5Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
6Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
7Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
8Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
9Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
10Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
11Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
12Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
13Designing high performance precursors for atomic layer deposition of silicon oxide
14Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
15Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
16Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
17Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride