Bis(Tert-ButylAmido)Silane, BTBAS, CAS# 186598-40-3

Where to buy

1Strem Chemicals, Inc.Bis(t-butylamino)silane, 97+% BTBAS does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send us an email.

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
3Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
4Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
5Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
6Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
7Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
8Designing high performance precursors for atomic layer deposition of silicon oxide
9Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
10Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at:


Follow @PlasmaALDGuy


© 2014-2018