Bis(Tert-ButylAmido)Silane, BTBAS, CAS# 186598-40-3

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NumberVendorLink
1Strem Chemicals, Inc.Bis(t-butylamino)silane, 97+% BTBAS

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberCompositionTitle
1SiNxAtomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
2SiNxAtomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
3SiNxAtomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
4SiNxLow-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
5SiNxRedeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
6SiNxRole of Surface Termination in Atomic Layer Deposition of Silicon Nitride
7SiO2Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
8SiO2Designing high performance precursors for atomic layer deposition of silicon oxide
9SiO2Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
10SiO2Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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