Publication Information

Title: Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma

Type: Presentation

Info: ALD 2009

Date: 2009-07-20

DOI: No DOI

Author Information

Name

Institution

Air Products

Air Products

Air Products

Air Products

Films

Plasma SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

7782-44-7

Thermal SiO2 using Quros 100

Deposition Temperature Range N/A

186598-40-3

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Substrates

Unknown

Keywords

Dielectric Thin Films

Notes

Presentation contains physical characteristics data. Probably same dataset as is in Air Products datasheet.

74

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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