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Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
Type:
Journal
Info:
Superlattices and Microstructures 125 (2019) 281-286
Date:
2018-11-19
Author Information
| Name | Institution |
|---|---|
| Wen Zhou | Chinese Academy of Sciences |
| Li Zheng | Chinese Academy of Sciences |
| Xinhong Cheng | Chinese Academy of Sciences |
| Wenjia Zhou | ShanghaiTech University |
| Peiyi Ye | University of California - Los Angeles (UCLA) |
| Lingyan Shen | Chinese Academy of Sciences |
| Dongliang Zhang | Chinese Academy of Sciences |
| Ziyue Gu | Chinese Academy of Sciences |
| Yuehui Yu | Chinese Academy of Sciences |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Optical Absorption
Analysis: Ellipsometry
Characteristic: Dielectric Constant, Permittivity
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Substrates
| Si(100) |
Notes
| 1613 |